专利内容由知识产权出版社提供
专利名称:PRE-COLORED METHODOLOGY OF
MULTIPLE PATTERNING
发明人:YEN-HUEI CHEN,HUNG-JEN
LIAO,JONATHAN TSUNG-YUNG CHANG
申请号:US14218001申请日:20140318
公开号:US20140201692A1公开日:20140717
专利附图:
摘要:Some embodiments relate to a system that pre-colors word lines and controllines within a memory cell to avoid timing delays that result from processing variations
introduced through multiple patterning lithography processes. The system has amemory element that stores a graphical IC layout with a memory circuit having layoutfeatures including a plurality of word lines and a plurality of Y-control lines. A pre-coloring element pre-colors one or more of the plurality of word lines and Y-controllines, to indicate that pre-colored word lines and Y-control lines are to be formed on asame mask of a multiple mask set used for a multiple patterning lithography process. Adecomposition element assigns different colors to uncolored layout features of thememory circuit, to indicate that different colored memory features are to be formed ondifferent masks of the multiple mask set.
申请人:TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
地址:HSIN-CHU TW
国籍:TW
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